Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/60502
Title: Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning
Authors: Tai Chou Lee
Pei Chun Chen
Ting Ying Lai
Wirote Tuntiwechapikul
Jun Hyun Kim
T. Randall Lee
Keywords: Materials Science
Issue Date: 30-Aug-2008
Abstract: This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10-C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13-C16) provide better protection against etching than the shorter chain-length ADTCAs (C10-C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications. © 2008 Elsevier B.V. All rights reserved.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=49549111582&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/60502
ISSN: 01694332
Appears in Collections:CMUL: Journal Articles

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