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dc.contributor.authorTai Chou Leeen_US
dc.contributor.authorPei Chun Chenen_US
dc.contributor.authorTing Ying Laien_US
dc.contributor.authorWirote Tuntiwechapikulen_US
dc.contributor.authorJun Hyun Kimen_US
dc.contributor.authorT. Randall Leeen_US
dc.description.abstractThis paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10-C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13-C16) provide better protection against etching than the shorter chain-length ADTCAs (C10-C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications. © 2008 Elsevier B.V. All rights reserved.en_US
dc.subjectMaterials Scienceen_US
dc.titleAliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterningen_US
article.title.sourcetitleApplied Surface Scienceen_US
article.volume254en_US Chung Cheng Universityen_US Mai Universityen_US of Houstonen_US
Appears in Collections:CMUL: Journal Articles

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