Novel Spark Method for Deposition of Metal Oxide Thin Films: Deposition of Hexagonal Tungsten Oxide

Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/63655

Title:	Novel Spark Method for Deposition of Metal Oxide Thin Films: Deposition of Hexagonal Tungsten Oxide
Authors:	Dimitrios Louloudakis Winai Thongpan Kyriakos Mouratis Emmanouel Koudoumas George Kiriakidis Pisith Singjai
Authors:	Dimitrios Louloudakis Winai Thongpan Kyriakos Mouratis Emmanouel Koudoumas George Kiriakidis Pisith Singjai
Keywords:	Engineering;Materials Science;Physics and Astronomy
Issue Date:	1-Jan-2019
Abstract:	© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim Hexagonal tungsten trioxide (WO3) layers are grown on indium tin oxide (ITO) substrates using a novel spark deposition system. The effects of deposition time, substrate temperature, and oxygen (O2) flow rate through the chamber on the structural and morphological characteristics as well as the electrochemical response of the layers are examined. It is found that a deposition temperature of 400 °C and O2 flow rate at 60 mL min−1 through the chamber can result in hexagonal WO3 with improved crystallinity and quite effective electrochemical/electrochromic response.
URI:	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85059700459&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/63655
ISSN:	18626319 18626300
Appears in Collections:	CMUL: Journal Articles

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