Deposition of TiC on γ-TiAl alloys by directly applying voltages

Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/62277

Title:	Deposition of TiC on γ-TiAl alloys by directly applying voltages
Authors:	Chatdanai Boonruang Titipun Thongtem Michael McNallan Somsorn Singkarat Somchai Thongtem
Authors:	Chatdanai Boonruang Titipun Thongtem Michael McNallan Somsorn Singkarat Somchai Thongtem
Keywords:	Materials Science;Physics and Astronomy
Issue Date:	1-Jan-2005
Abstract:	Two γ-TiAl alloys, Ti-47Al-2Nb-2Cr (MJ12) and Ti-47Al-2Nb-2Mn-0. 8TiB2 (MJ47), were pressed in C powder to form rods and carburized by directly applying electrical power through them at 274.3 ± 26.4 W, 80 A for MJ12 and at 293.4 ± 16.8 W, 80 A for MJ47 in Ar atmosphere. The alloys were analysed using an x-ray diffractometer (XRD), a scanning electron microscope (SEM) equipped with an energy dispersive x-ray (EDX) analyser and a Rutherford backscattering spectrometer (RBS) incorporated with NUSDAN solfware. Knoop hardness and wear resistance were improved and found to be in accord with the analytical results. © 2005 Trans Tech Publications, Switzerland.
URI:	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=24944450798&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/62277
ISSN:	10120394
Appears in Collections:	CMUL: Journal Articles

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