Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/61389
Title: Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
Authors: Nitisak Pasaja
Sakon Sansongsiri
Saweat Intarasiri
Thiraphat Vilaithong
André Anders
Keywords: Physics and Astronomy
Issue Date: 1-Jun-2007
Abstract: Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas it was absent when the molybdenum plasma was presented. Film thickness was measured after deposition by profilometry. Glass slides with silver pads were used as substrates for the measurement of the sheet resistance. The microstructure and composition of the films were characterized by Raman spectroscopy and Rutherford backscattering, respectively. It was found that the electrical resistivity decreases with an increase of the Mo content, which can be ascribed to an increase of the sp2content and an increase of the sp2cluster size. © 2007 Elsevier B.V. All rights reserved.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34248680771&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/61389
ISSN: 0168583X
Appears in Collections:CMUL: Journal Articles

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