Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/60407
Title: Microstructure and interfaces of thin film capacitors on base metal foils
Authors: T. Dechakupt
G. Yang
I. M. Reaney
C. A. Randall
S. Trolier-McKinstry
Keywords: Engineering
Issue Date: 1-Dec-2008
Abstract: The microstructure and interface quality of chemical solution deposited barium titanate thin films on Ni foil were studied. Cross-sectional transmission electron microscopy shows that a ∼200 nm thick barium titanate film annealed in a controlled oxygen partial pressure consists of equiaxed grains with grain size range of 24-75 nm (∼ 42 nm average). NiO was detected after re-oxidation by X-ray diffraction, but not by transmission electron microscopy, suggesting that the oxide is not a continuous barrier layer, but is spatially distributed in the films. Oxygen non-stoichiometry and the existence of C in barium titanate films were observed by electron energy loss spectrometry. In addition, it was found that there is a 5-8 nm thick Ni-Ba alloy developed at the interface between the barium titanate film and Ni foil. © 2008 Trans Tech Publications, Switzerland.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=62949247701&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/60407
ISSN: 10226680
Appears in Collections:CMUL: Journal Articles

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