Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/59132
Title: External-electric-field-enhanced uniformity and deposition rate of a TiO<inf>2</inf>film prepared by the sparking process
Authors: W. Thongpan
T. Kumpika
E. Kantarak
A. Panthawan
P. Pooseekheaw
P. Singjai
A. Tuantranont
W. Thongsuwan
Keywords: Physics and Astronomy
Issue Date: 12-Jul-2018
Abstract: © W. THONGPAN, T. KUMPIKA, E. KANTARAK, A. PANTHAWAN, P. POOSEEKHEAW, P. SINGJAI, A. TUANTRANONT, W. THONGSUWAN, 2018. We have used an external electric field to increase both the uniformity and deposition rate of TiO2films. The experiment is carried out by sparking-off titanium wires with a high dc voltage of 1 kV (field Eint= 10 kV/cm) and a limited current of 3 mA. The external electric fields (Eext) of 3, 6, and 9 kV/cm were applied to the sparking system for 1–5 hours. The as-deposited film morphology was characterized by scanning electron microscopy. The results clearly show that the films are only deposited on the external electric field area. Furthermore, the deposition rate of the films increased from 40.7% to 77.8% in the presence of the external electric field of 9 kV/cm. The effects of an external electric field on both the deposition rate and uniformity of films are investigated and described.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85050258400&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/59132
ISSN: 20710194
20710186
Appears in Collections:CMUL: Journal Articles

Files in This Item:
There are no files associated with this item.


Items in CMUIR are protected by copyright, with all rights reserved, unless otherwise indicated.