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dc.contributor.authorM. Medhisuwakulen_US
dc.contributor.authorS. Kytziaen_US
dc.contributor.authorJ. Engemannen_US
dc.contributor.authorT. Vilaithongen_US
dc.date.accessioned2018-09-11T09:02:03Z-
dc.date.available2018-09-11T09:02:03Z-
dc.date.issued2006-08-01en_US
dc.identifier.issn13616595en_US
dc.identifier.issn09630252en_US
dc.identifier.other2-s2.0-33745603516en_US
dc.identifier.other10.1088/0963-0252/15/3/014en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=33745603516&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/61938-
dc.description.abstractA microwave plasma source operated at a frequency of 2.45 GHz has been used for ion beam neutralization. It could provide a sufficient number of electrons to neutralize a high current ion beam. However, it was operated with high reflection powers. Experimentally changing waveguide dimensions to get an optimum operating condition is difficult, time-consuming and cumbersome. The key approach for a good and stable working plasma source is to get the right dimensions, by three-dimensional simulation tools. Therefore, a three-dimensional computer simulation program was used to calculate the microwave parameters, and to reveal the behaviour inside the source. It utilizes a single block, non-self-consistent model with Drude dispersion to represent the plasma. For this model the plasma angular frequency, ωp, and the electron-heavy particle collision frequency, νe, have to be investigated. This simple yet powerful model allows the analysis and optimization of the source to identify the best dimensions. © 2006 IOP Publishing Ltd.en_US
dc.subjectPhysics and Astronomyen_US
dc.titleNumerical analysis and optimization of the microwave plasma source for ion beam neutralizationen_US
dc.typeJournalen_US
article.title.sourcetitlePlasma Sources Science and Technologyen_US
article.volume15en_US
article.stream.affiliationsChiang Mai Universityen_US
article.stream.affiliationsBergische Universitat Wuppertalen_US
Appears in Collections:CMUL: Journal Articles

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