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dc.contributor.authorC. Chaiwongen_US
dc.contributor.authorP. Rachtanapunen_US
dc.contributor.authorP. Wongchaiyaen_US
dc.contributor.authorR. Aurasen_US
dc.contributor.authorD. Boonyawanen_US
dc.date.accessioned2018-09-04T04:43:51Z-
dc.date.available2018-09-04T04:43:51Z-
dc.date.issued2010-06-01en_US
dc.identifier.issn02578972en_US
dc.identifier.other2-s2.0-77953358689en_US
dc.identifier.other10.1016/j.surfcoat.2010.02.048en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=77953358689&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/50672-
dc.description.abstractIn this work, we investigated the influence of SF6 plasma generated by an inductively coupled discharge on the hydrophobicity and barrier properties of poly(lactic acid), PLA. It was found that SF6 plasma enhanced the hydrophobicity of PLA as observed in the increase of the water contact angle. Water absorption time of the plasma-treated PLA was two-fold increased. However, the plasma treatment did not have significant influence on water vapor permeability of PLA. The differential scanning calorimetry results revealed that the bulk structure which controls transportation property of PLA remained unchanged after plasma treatment. Atomic force microscopy showed topographical modification after plasma treatment. Attenuated total reflectance Fourier transform infrared spectroscopy and x-ray photoelectron spectroscopy showed the bounding of fluorines in the PLA structure, which leads to the increase in hydrophobicity of PLA. © 2010 Elsevier B.V.en_US
dc.subjectChemistryen_US
dc.subjectMaterials Scienceen_US
dc.subjectPhysics and Astronomyen_US
dc.titleEffect of plasma treatment on hydrophobicity and barrier property of polylactic aciden_US
dc.typeJournalen_US
article.title.sourcetitleSurface and Coatings Technologyen_US
article.volume204en_US
article.stream.affiliationsChiang Mai Universityen_US
article.stream.affiliationsThEP Centreen_US
article.stream.affiliationsMichigan State Universityen_US
Appears in Collections:CMUL: Journal Articles

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