Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/71673
Title: Hot air treatment: Alternative annealing of TiO<inf>2</inf>nanoparticulate films without substrate deformation
Authors: Arisara Panthawan
Winai Thongpan
Porntipa Pooseekheaw
Nidchamon Jumrus
Tewasin Kumpika
Wattikon Sroila
Ekkapong Kantarak
Panupong Sanmuangmoon
Adisorn Tuantranont
Wiradej Thongsuwan
Pisith Singjai
Authors: Arisara Panthawan
Winai Thongpan
Porntipa Pooseekheaw
Nidchamon Jumrus
Tewasin Kumpika
Wattikon Sroila
Ekkapong Kantarak
Panupong Sanmuangmoon
Adisorn Tuantranont
Wiradej Thongsuwan
Pisith Singjai
Keywords: Physics and Astronomy
Issue Date: 26-Oct-2020
Abstract: © 2020 Author(s). Titanium dioxide (TiO2) nanoparticulate films was successfully annealed on a glass substrate via alternative hot air treatment (HAT). Interestingly, HAT not only protects the glass substrate deformation but can also reduce cost and time in the annealing process. The annealed films using HAT at 500 °C for 10min can be compared with the annealed films in conventional furnace heat treatment (FHT) at 500 °C for 60min. The results showed the sizes of ∼7.9nm are obtained after the films annealed with both annealing techniques. The surface roughness of the as-deposited, the annealed films using FHT and HAT were 17.37, 23.74 and 23.26nm, respectively. The energy band gap of the as- deposited films, the annealed films using FHT and HAT were 3.24 eV, 3.1 and 3.19 eV, respectively. Moreover, the annealed films using FHT and HAT techniques show superhydrophilic with a water contact angle of 3.42° and 2.81°, while the as-deposited films was 8.93°. After aging time testing, superhydrophilicity of the annealed films using HAT is greater than FHT. The result is in good agreement with Ti wt% of the as-deposited, the annealed films using FHT and HAT left on the substrate to 0.15, 0.73 and 0.65nm after testing simulation for 20 years.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85096463061&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/71673
ISSN: 15517616
0094243X
Appears in Collections:CMUL: Journal Articles

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