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Title: | Hot air treatment: Alternative annealing of TiO<inf>2</inf>nanoparticulate films without substrate deformation |
Authors: | Arisara Panthawan Winai Thongpan Porntipa Pooseekheaw Nidchamon Jumrus Tewasin Kumpika Wattikon Sroila Ekkapong Kantarak Panupong Sanmuangmoon Adisorn Tuantranont Wiradej Thongsuwan Pisith Singjai |
Authors: | Arisara Panthawan Winai Thongpan Porntipa Pooseekheaw Nidchamon Jumrus Tewasin Kumpika Wattikon Sroila Ekkapong Kantarak Panupong Sanmuangmoon Adisorn Tuantranont Wiradej Thongsuwan Pisith Singjai |
Keywords: | Physics and Astronomy |
Issue Date: | 26-Oct-2020 |
Abstract: | © 2020 Author(s). Titanium dioxide (TiO2) nanoparticulate films was successfully annealed on a glass substrate via alternative hot air treatment (HAT). Interestingly, HAT not only protects the glass substrate deformation but can also reduce cost and time in the annealing process. The annealed films using HAT at 500 °C for 10min can be compared with the annealed films in conventional furnace heat treatment (FHT) at 500 °C for 60min. The results showed the sizes of ∼7.9nm are obtained after the films annealed with both annealing techniques. The surface roughness of the as-deposited, the annealed films using FHT and HAT were 17.37, 23.74 and 23.26nm, respectively. The energy band gap of the as- deposited films, the annealed films using FHT and HAT were 3.24 eV, 3.1 and 3.19 eV, respectively. Moreover, the annealed films using FHT and HAT techniques show superhydrophilic with a water contact angle of 3.42° and 2.81°, while the as-deposited films was 8.93°. After aging time testing, superhydrophilicity of the annealed films using HAT is greater than FHT. The result is in good agreement with Ti wt% of the as-deposited, the annealed films using FHT and HAT left on the substrate to 0.15, 0.73 and 0.65nm after testing simulation for 20 years. |
URI: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85096463061&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/71673 |
ISSN: | 15517616 0094243X |
Appears in Collections: | CMUL: Journal Articles |
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