Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/71673
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dc.contributor.authorArisara Panthawanen_US
dc.contributor.authorWinai Thongpanen_US
dc.contributor.authorPorntipa Pooseekheawen_US
dc.contributor.authorNidchamon Jumrusen_US
dc.contributor.authorTewasin Kumpikaen_US
dc.contributor.authorWattikon Sroilaen_US
dc.contributor.authorEkkapong Kantaraken_US
dc.contributor.authorPanupong Sanmuangmoonen_US
dc.contributor.authorAdisorn Tuantranonten_US
dc.contributor.authorWiradej Thongsuwanen_US
dc.contributor.authorPisith Singjaien_US
dc.date.accessioned2021-01-27T04:02:39Z-
dc.date.available2021-01-27T04:02:39Z-
dc.date.issued2020-10-26en_US
dc.identifier.issn15517616en_US
dc.identifier.issn0094243Xen_US
dc.identifier.other2-s2.0-85096463061en_US
dc.identifier.other10.1063/5.0024035en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85096463061&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/71673-
dc.description.abstract© 2020 Author(s). Titanium dioxide (TiO2) nanoparticulate films was successfully annealed on a glass substrate via alternative hot air treatment (HAT). Interestingly, HAT not only protects the glass substrate deformation but can also reduce cost and time in the annealing process. The annealed films using HAT at 500 °C for 10min can be compared with the annealed films in conventional furnace heat treatment (FHT) at 500 °C for 60min. The results showed the sizes of ∼7.9nm are obtained after the films annealed with both annealing techniques. The surface roughness of the as-deposited, the annealed films using FHT and HAT were 17.37, 23.74 and 23.26nm, respectively. The energy band gap of the as- deposited films, the annealed films using FHT and HAT were 3.24 eV, 3.1 and 3.19 eV, respectively. Moreover, the annealed films using FHT and HAT techniques show superhydrophilic with a water contact angle of 3.42° and 2.81°, while the as-deposited films was 8.93°. After aging time testing, superhydrophilicity of the annealed films using HAT is greater than FHT. The result is in good agreement with Ti wt% of the as-deposited, the annealed films using FHT and HAT left on the substrate to 0.15, 0.73 and 0.65nm after testing simulation for 20 years.en_US
dc.subjectPhysics and Astronomyen_US
dc.titleHot air treatment: Alternative annealing of TiO<inf>2</inf>nanoparticulate films without substrate deformationen_US
dc.typeConference Proceedingen_US
article.title.sourcetitleAIP Conference Proceedingsen_US
article.volume2279en_US
article.stream.affiliationsThailand National Electronics and Computer Technology Centeren_US
article.stream.affiliationsChiang Mai Universityen_US
Appears in Collections:CMUL: Journal Articles

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