Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/53492
Title: 3D simulations on surface growth via chemical vapour deposition: Kinetic monte carlo investigation
Authors: Arjaree Thongon
Supab Choopun
Rattikorn Yimnirun
Yongyut Laosiritaworn
Keywords: Engineering
Materials Science
Physics and Astronomy
Issue Date: 24-Jul-2014
Abstract: In this study, we used the kinetic Monte Carlo simulation to investigate the growth dynamic of the films on a substrate by imitating the chemical vapour deposition process. As a prototype, the system was confined into three-dimensional slap where the deposit chamber was divided into array grids. The vapour flowed in and out with varying rates and concentrations and the growth process took place on the substrate placed at the bottom of the array. Interaction among atoms was considered to take Ising-like, and Kawasaki algorithm is used in this study to observe the average thickness and its variance. The result shows that for the increasing temperature, the average thickness decreases at fixed rates and concentration. With increasing the rates, at fixed concentration, the average thickness decrease at low temperature. Furthermore, the average thickness greatly increases at low temperature with increasing the concentration, at fixed rates. © 2014 Taylor & Francis Group, LLC.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84901420608&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/53492
ISSN: 16078489
10584587
Appears in Collections:CMUL: Journal Articles

Files in This Item:
There are no files associated with this item.


Items in CMUIR are protected by copyright, with all rights reserved, unless otherwise indicated.