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dc.contributor.authorNidchamon Jumrusen_US
dc.contributor.authorJongrak Jompaengen_US
dc.contributor.authorArisara Panthawanen_US
dc.contributor.authorTewasin Kumpikaen_US
dc.contributor.authorOrawan Wiranwetchayanen_US
dc.contributor.authorPanupong Sanmuangmoonen_US
dc.contributor.authorWattikon Sroilaen_US
dc.contributor.authorEkkapong Kantaraken_US
dc.contributor.authorPisith Singjaien_US
dc.contributor.authorWiradej Thongsuwanen_US
dc.date.accessioned2022-10-16T07:10:59Z-
dc.date.available2022-10-16T07:10:59Z-
dc.date.issued2021-12-01en_US
dc.identifier.issn18734979en_US
dc.identifier.issn0167577Xen_US
dc.identifier.other2-s2.0-85112430405en_US
dc.identifier.other10.1016/j.matlet.2021.130618en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85112430405&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/76500-
dc.description.abstractA transparent and water-resistant superhydrophobic acrylic surface was successfully fabricated via the use of tetrahydrofuran/isopropyl alcohol (THF/IPA) etching-assisted SiO2 nanoparticles (NPs). A coating solution was prepared by mixing methyltrichlorosilane (MTCS)-modified SiO2 nanoparticles in THF/IPA at different ratios to improve the superhydrophobicity and roughness of the acrylic surface. The acrylic was then dipped into the coating solution for 1 min under ambient air. Superhydrophobicity with a high water contact angle (>155°) and low sliding angle (<5°) was observed after modification of the acrylic surfaces. A sample prepared using a THF/IPA ratio of 50/50 showed a normalized transmittance of 88%, which was determined to be the optimum condition. Moreover, the water resistance of samples prepared using a THF/IPA ratio higher than 50/50 reached over 18,000 drops, which is a necessary requirement for transparent self-cleaning applications.en_US
dc.subjectEngineeringen_US
dc.subjectMaterials Scienceen_US
dc.subjectPhysics and Astronomyen_US
dc.titleTransparency and water resistance of a superhydrophobic acrylic surface prepared using THF/IPA etching-assisted SiO<inf>2</inf> NPsen_US
dc.typeJournalen_US
article.title.sourcetitleMaterials Lettersen_US
article.volume304en_US
article.stream.affiliationsChiang Mai Universityen_US
Appears in Collections:CMUL: Journal Articles

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