Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/76480
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dc.contributor.authorPiyawat Maneepethen_US
dc.contributor.authorPanida Thararaken_US
dc.contributor.authorPeerapol Jirapongen_US
dc.contributor.authorChatuphat Karaaomen_US
dc.date.accessioned2022-10-16T07:10:40Z-
dc.date.available2022-10-16T07:10:40Z-
dc.date.issued2021-03-10en_US
dc.identifier.other2-s2.0-85107786346en_US
dc.identifier.other10.1109/iEECON51072.2021.9440357en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85107786346&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/76480-
dc.description.abstractThe improper grounding technique can cause a high induced current in the underground cable's metallic sheath, leading to the fault event and insulation degradation in the underground cable systems. In this paper, the proper design and selection of the grounding technique, including the installation of a sheath voltage limiter (SVL) and a parallel ground continuity conductor (PGCC) for underground cable systems, are presented. System modeling and simulation are performed using PSCAD/EMTDC software to assess the magnitude of the induced current and overvoltage in the cable systems. The comparative studies and simulation results show that the single-point bonding technique with the installation of the proposed SVL and PGCC rating can mitigate the problem of induced current in the metallic sheath and protect electrical equipment from transient overvoltages effectively.en_US
dc.subjectEnergyen_US
dc.subjectEngineeringen_US
dc.subjectPhysics and Astronomyen_US
dc.titleMitigation of Induced Currents and Overvoltages in Metallic Sheath of 115 kV Underground Cable Using Sheath Voltage Limiter and Parallel Ground Continuity Conductoren_US
dc.typeConference Proceedingen_US
article.title.sourcetitleProceeding of the 2021 9th International Electrical Engineering Congress, iEECON 2021en_US
article.stream.affiliationsChiang Mai Universityen_US
Appears in Collections:CMUL: Journal Articles

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