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Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/61937
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dc.contributor.authorS. Narksitipanen_US
dc.contributor.authorT. Thongtemen_US
dc.contributor.authorM. MacNallanen_US
dc.contributor.authorS. Thongtemen_US
dc.date.accessioned2018-09-11T09:02:03Z-
dc.date.available2018-09-11T09:02:03Z-
dc.date.issued2006-08-01en_US
dc.identifier.issn14358115en_US
dc.identifier.issn14319276en_US
dc.identifier.other2-s2.0-33750857935en_US
dc.identifier.other10.1017/S1431927606062283en_US
dc.identifier.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=33750857935&origin=inwarden_US
dc.identifier.urihttp://cmuir.cmu.ac.th/jspui/handle/6653943832/61937-
dc.subjectPhysics and Astronomyen_US
dc.titleAcetylene plasma deposition on gamma-TiAl alloysen_US
dc.typeJournalen_US
article.title.sourcetitleMicroscopy and Microanalysisen_US
article.volume12en_US
article.stream.affiliationsChiang Mai Universityen_US
article.stream.affiliationsUniversity of Illinois at Chicagoen_US
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