Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/55712
Title: Role of molybdenum substitutional dopants on H<inf>2</inf>S-sensing enhancement of flame-spray-made SnO<inf>2</inf>nanoparticulate thick films
Authors: S. Kabcum
N. Tammanoon
A. Wisitsoraat
A. Tuantranont
S. Phanichphant
C. Liewhiran
Authors: S. Kabcum
N. Tammanoon
A. Wisitsoraat
A. Tuantranont
S. Phanichphant
C. Liewhiran
Keywords: Engineering;Materials Science;Physics and Astronomy
Issue Date: 1-Nov-2016
Abstract: © 2016 Elsevier B.V. In this work, Mo-doped SnO2nanoparticulate sensing films were fabricated by flame spray pyrolysis (FSP) and spin-coating processes with varying Mo-doping concentrations (0–2 wt%) and numbers of spin-coating cycles (1–5). Structural characterizations by electron microscopy and X-ray analysis suggested that Mo atoms were substitutionally doped in polycrystalline SnO2nanoparticles at low Mo concentrations (<1 wt%) but then segregated as secondary MoO3crystallites at high Mo levels (1–2 wt%). In addition, the incorporation of Mo resulted in the reduction of size and the increase of surface area of SnO2nanoparticles. The gas-sensing properties of sensors were investigated towards H2S, NO2, NH3, H2and CO at the working temperature ranging from 150 °C to 350 °C. The results showed that the moderate Mo-doping level of 0.5 wt% and the high number of spin-coating cycles of 4 led to the optimal enhancement of H2S response. The optimal Mo concentration could be correlated to the highest doping level that did not induce secondary MoO3crystallites. In particular, the 0.5 wt% Mo-doped SnO2sensor prepared with 4 spin-coating cycles exhibited a high response of ∼105 and a short response time of ∼5 s–10 ppm H2S at an optimal working temperature of 250 °C. Furthermore, the optimal sensor displayed good H2S selectivity against NO2, NH3, H2and CO. Therefore, the flame-spray-made Mo-doped SnO2thick film sensor is a promising candidate for sensitive and selective detection of H2S at a threshold limit value (TLV) of lower than 10 ppm and may be useful for general industrial applications.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84976513699&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/55712
ISSN: 09254005
Appears in Collections:CMUL: Journal Articles

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