Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/55405
Title: Effect of a low gas pressure plasma treatment on copper substrate used for carbon nanotubes synthesis
Authors: C. Suttichart
D. Boonyawan
W. Nhuapeng
W. Thamjaree
Keywords: Chemistry
Materials Science
Physics and Astronomy
Issue Date: 25-Nov-2016
Abstract: © 2016 Effects of two different mixtures of working gas, namely, 10%Ar + 90%H2and 10%Ar + 90%N2, used in low pressure plasma treatment of copper substrate surface modification in the synthesis of carbon nanotubes by the ACVD method were investigated and compared. After a chemical vapor deposition process, the samples were characterized by SEM and TEM microscopy and X-ray diffraction technique. Analysis of the micrographs and spectra obtained showed that H2plasma (obtained from a mixture of 10%Ar + 90%H2) treatment developed higher degree of surface roughness, smaller contact angle which leads to better hydrophilic property of the treated surface, and stronger adhesion of the Cu substrate which resulted in higher yields of the synthesized CNTs. In addition, the origins of these results were discussed with respect to the process parameters and hence the plasma environment. Abstract code AP 19
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84979650471&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/55405
ISSN: 02578972
Appears in Collections:CMUL: Journal Articles

Files in This Item:
There are no files associated with this item.


Items in CMUIR are protected by copyright, with all rights reserved, unless otherwise indicated.