Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/54858
Title: Low-energy plasma immersion ion implantation to induce DNA transfer into bacterial E. coli
Authors: K. Sangwijit
L. D. Yu
S. Sarapirom
S. Pitakrattananukool
S. Anuntalabhochai
Keywords: Physics and Astronomy
Issue Date: 15-Dec-2015
Abstract: © 2015 Elsevier B.V. Plasma immersion ion implantation (PIII) at low energy was for the first time applied as a novel biotechnology to induce DNA transfer into bacterial cells. Argon or nitrogen PIII at low bias voltages of 2.5, 5 and 10 kV and fluences ranging from 1 × 1012to 1 × 1017ions/cm2treated cells of Escherichia coli (E. coli). Subsequently, DNA transfer was operated by mixing the PIII-treated cells with DNA. Successes in PIII-induced DNA transfer were demonstrated by marker gene expressions. The induction of DNA transfer was ion-energy, fluence and DNA-size dependent. The DNA transferred in the cells was confirmed functioning. Mechanisms of the PIII-induced DNA transfer were investigated and discussed in terms of the E. coli cell envelope anatomy. Compared with conventional ion-beam-induced DNA transfer, PIII-induced DNA transfer was simpler with lower cost but higher efficiency.
URI: https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84948575625&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54858
ISSN: 0168583X
Appears in Collections:CMUL: Journal Articles

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