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Please use this identifier to cite or link to this item: http://cmuir.cmu.ac.th/jspui/handle/6653943832/34957
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dc.contributor.authorNitipon Puttaraksaen_US
dc.date.accessioned2014-09-19T04:53:50Z-
dc.date.available2014-09-19T04:53:50Z-
dc.date.issued2011en_US
dc.identifier.govdocTh 763 N729Den_US
dc.identifier.urihttp://search.lib.cmu.ac.th/search/?searchtype=.&searcharg=b1500158en_US
dc.identifier.urihttp://cmuir.cmu.ac.th/handle/6653943832/34957-
dc.language.isoengen_US
dc.publisherChiang Mai : The Graduate School ,Chiang Mai University, 2011en_US
dc.subjectLithography -- Techniqueen_US
dc.subjectMicrofluidicsen_US
dc.titleDevelopment of MeV Ion beam lithography technique for microfluidic applications = การพัฒนาเทคนิคโธกราฟีที่ใช้ลำไอออนพลังงานระดับเอ็มอีวี สำหรับการประยุกต์ของไหลระดับไมครอน / Nitipon Puttaraksaen_US
dc.typeThesisen_US
Appears in Collections:SCIENCE: Theses

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