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dc.contributor.authorThanaporn Tohsophonen_US
dc.date.accessioned2014-09-19T04:44:59Z-
dc.date.available2014-09-19T04:44:59Z-
dc.date.issued2006en_US
dc.identifier.govdocTh 621.381 T367Sen_US
dc.identifier.urihttp://search.lib.cmu.ac.th/search/?searchtype=.&searcharg=b1400733en_US
dc.identifier.urihttp://cmuir.cmu.ac.th/handle/6653943832/34193-
dc.language.isoengen_US
dc.publisherChiang Mai : Graduate School, Chiang Mai University, 2006en_US
dc.subjectElectronics -- Materialsen_US
dc.subjectThin filmsen_US
dc.subjectMetallic oxidesen_US
dc.subjectMetals -- Anodic oxidationen_US
dc.titleStructures and properties of aluminum doped zinc oxide transparent conductive thin films prepared by sputtering technique = โครงสร้างและสมบัติของฟิล์มบางตัวนำโปร่งใสซิงค์ออกไซด์เจือด้วยอะลูมิเนียมเตรียมโดยเทคนิคสปัตเตอร์ / Thanaporn Tohsophonen_US
dc.typeThesisen_US
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