Browsing by Author Puttaraksa N.

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Showing results 1 to 13 of 13
Issue DateTitleAuthor(s)
-Development of economic MeV-ion microbeam technology at Chiang Mai UniversitySingkarat S.; Puttaraksa N.; Unai S.; Yu L.; Singkarat K.; Pussadee N.; Whitlow H.; Natyanum S.; Tippawan U.
2013Development of procedures for programmable proximity aperture lithographyWhitlow H.J.; Gorelick S.; Puttaraksa N.; Napari M.; Hokkanen M.J.; Norarat R.
2011Direct writing of channels for microfluidics in silica by MeV ion beam lithographyPuttaraksa N.; Napari M.; Chienthavorn O.; Norarat R.; Sajavaara T.; Laitinen M.; Singkarat S.; Whitlow H.J.
-Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithographyPuttaraksa N.; Unai S.; Rhodes M.W.; Singkarat K.; Whitlow H.J.; Singkarat S.
-Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithographyPuttaraksa N.; Unai S.; Rhodes M.W.; Singkarat K.; Whitlow H.J.; Singkarat S.
2008Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)Gorelick S.; Puttaraksa N.; Sajavaara T.; Laitinen M.; Singkarat S.; Whitlow H.J.
2013Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protonsUnai S.; Puttaraksa N.; Pussadee N.; Singkarat K.; Rhodes M.W.; Whitlow H.J.; Singkarat S.
2013Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2 MeV protonsUnai S.; Puttaraksa N.; Pussadee N.; Singkarat K.; Rhodes M.W.; Whitlow H.J.; Singkarat S.
2012Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resistUnai S.; Puttaraksa N.; Pussadee N.; Singkarat K.; Rhodes M.W.; Whitlow H.J.; Singkarat S.
2012Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resistUnai S.; Puttaraksa N.; Pussadee N.; Singkarat K.; Rhodes M.W.; Whitlow H.J.; Singkarat S.
27-Feb-2012Influence of MeV H + ion beam flux on cross-linking and blister formation in PMMA resistUnai S.; Puttaraksa N.; Pussadee N.; Singkarat K.; Rhodes M.; Whitlow H.; Singkarat S.
-Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ionsPuttaraksa N.; Norarat R.; Laitinen M.; Sajavaara T.; Singkarat S.; Whitlow H.J.
2008Programmable proximity aperture lithography with MeV ion beamsPuttaraksa N.; Gorelick S.; Sajavaara T.; Laitinen M.; Singkarat S.; Whitlow H.J.